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Proceedings Paper

Fabrication of microlens array for the IR by lithographic processes using an inorganic chalcogenide photoresist
Author(s): Naftali Paul Eisenberg; M. Manevich; Matvei Klebanov; S. Shutina; Victor Lyubin
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Paper Abstract

Micro-optical elements, particularly microlenses, are finding growing application in different fields of modern optoelectronics. One of the most promising methods of microlens fabrication is based on photolithographic processes. Organic photoresists were used in the earlier development of microlens arrays. A new technique of microlens fabrication using inorganic chalcogenide photoresists is presented. Such photoresists have many advantages, such as very high resolution, photosensitivity in wide spectral range, high values of refractive index, transparency in the IR range, and the ability to be used as positive or negative resists depending on the developer used. These unique properties create new possibilities for the development of microlens arrays in the IR.

Paper Details

Date Published: 6 June 1995
PDF: 7 pages
Proc. SPIE 2426, 9th Meeting on Optical Engineering in Israel, (6 June 1995); doi: 10.1117/12.211195
Show Author Affiliations
Naftali Paul Eisenberg, Jerusalem College of Technology (Israel)
M. Manevich, Jerusalem College of Technology (Israel)
Matvei Klebanov, Ben-Gurion Univ. of the Negev (Israel)
S. Shutina, Ben-Gurion Univ. of the Negev (Israel)
Victor Lyubin, Ben-Gurion Univ. of the Negev (Israel)


Published in SPIE Proceedings Vol. 2426:
9th Meeting on Optical Engineering in Israel
Itzhak Shladov; Yitzhak Wiessman; Natan Kopeika, Editor(s)

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