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Proceedings Paper

Photomask fabrication of focusing diffractive optical elements using electron-beam lithography
Author(s): Sergey V. Babin; Victor A. Danilov
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Paper Abstract

The electron beam lithography application to diffractive optical elements topology generation is examined. The formula for the estimation of exposure data volume for variable shaped electron beam lithography is presented as a function of diffractive optical element parameters and approximation accuracy. Special software was developed to prepare exposure data for diffractive optical elements fabrication. Diffractive optical elements with an artificial refractive index were manufactured with a feature size much less than the wavelength. Design and experimental results on photomasks fabrication are presented for an optical element focusing irradiation into a ring with ordered parameters. The photomask set was manufactured for reflecting optical element focusing high power CO2 laser beam into two points with required parameters for laser welding.

Paper Details

Date Published: 6 June 1995
PDF: 13 pages
Proc. SPIE 2426, 9th Meeting on Optical Engineering in Israel, (6 June 1995); doi: 10.1117/12.211192
Show Author Affiliations
Sergey V. Babin, Univ. Erlangen-Nuernberg (United States)
Victor A. Danilov, Central Unique Design Institute (Russia)

Published in SPIE Proceedings Vol. 2426:
9th Meeting on Optical Engineering in Israel
Itzhak Shladov; Yitzhak Wiessman; Natan Kopeika, Editor(s)

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