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Proceedings Paper

Simultaneous use of two open-path FTIR spectrometers for data collection in complex source environments
Author(s): Robert J. Kricks; Douglas E. Pescatore; Stephen H. Perry; Amy E. DuBois
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Paper Abstract

This paper describes a technique involving the use of two open-path Fourier-transform infrared (FTIR) spectrometers to isolate emissions in complex source environments such as oil refineries or chemical manufacturing facilities. Typically, open-path FTIR monitoring involves collection or generation of an upwind (background) spectrum (I0) prior to the commencement of measurement activities, and the use of that spectrum to create absorbances for subsequent downwind (sample) spectra (I0) values. In situations where the upwind single beam spectrum is relatively clean or unchanging in time with respect to target compounds and interferences, this method of handling I0 is generally satisfactory. However, in complex source environments where either I0 or I values can change rapidly, the simultaneous use of two open- path units can yield substantial improvements, especially with respect to target compound detection limits. Although the use of two FTIR units can greatly improve the problem of background variation for target compounds as well as for background atmospheric components and interferences, it introduces a number of other problems resulting in difficulties in the analysis of the resultant absorbance spectra. These problems are discussed, and some recently collected field data showing the application of this technique is presented.

Paper Details

Date Published: 31 May 1995
PDF: 12 pages
Proc. SPIE 2365, Optical Sensing for Environmental and Process Monitoring, (31 May 1995); doi: 10.1117/12.210795
Show Author Affiliations
Robert J. Kricks, ETG Services, Inc. (United States)
Douglas E. Pescatore, ETG Services, Inc. (United States)
Stephen H. Perry, ETG Services, Inc. (United States)
Amy E. DuBois, ETG Services, Inc. (United States)

Published in SPIE Proceedings Vol. 2365:
Optical Sensing for Environmental and Process Monitoring
Orman A. Simpson, Editor(s)

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