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Proceedings Paper

Silicon micromachining and its applications
Author(s): Yu-Chong Tai; Chih-Ming Ho
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Paper Abstract

Recent development of silicon micromachining technology has made possible the fabrication of many micromechanical devices. Applications of these micromechanical devices are many, but their use for smart structures and materials has just begun. Here, an updated report on the development of a drag-reducing smart skin is given. In order to facilitate the fabrication of the smart skin, we have first developed a new sacrificial-layer etching model for etching phosphosilicate-glass using hydrofluoric acid. This model then leads to the development of two key devices for the skin, including a shear-stress sensor and a magnetic microactuator.

Paper Details

Date Published: 26 May 1995
PDF: 11 pages
Proc. SPIE 2448, Smart Structures and Materials 1995: Smart Electronics, (26 May 1995); doi: 10.1117/12.210457
Show Author Affiliations
Yu-Chong Tai, California Institute of Technology (United States)
Chih-Ming Ho, Univ. of California/Los Angeles (United States)


Published in SPIE Proceedings Vol. 2448:
Smart Structures and Materials 1995: Smart Electronics
Vijay K. Varadan, Editor(s)

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