Share Email Print
cover

Proceedings Paper

Molecular simulation of photoresists II: application to PAC diffusion
Author(s): Andrew J. Blakeney; Lawrence Ferreira; Medhat A. Toukhy; Patricia Morra; Nicholas M. Reynolds
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Recent advances in computer hardware and software have provided the capability to simulate complex mixtures of compounds on a molecular level. These tools provide the potential for exploration of resist chemistry and mechanism on a molecular level with visual feedback. Molecular simulations of a DNQ novolac resist were used in an unsuccessful attempt to visualize and study PAC diffusion during PEB. Simulation of PAC molecules allowed the calculation of the Connolly surface and hence the volume of space occupied by the PAC molecule. A reasonable correlation of the Connolly volume with the decrease in standing waves after PEB as measured from DRM curves was observed. This supports a PAC diffusion mechanism for PEB reduction of standing waves.

Paper Details

Date Published: 9 June 1995
PDF: 12 pages
Proc. SPIE 2438, Advances in Resist Technology and Processing XII, (9 June 1995); doi: 10.1117/12.210388
Show Author Affiliations
Andrew J. Blakeney, OCG Microelectronic Materials, Inc. (United States)
Lawrence Ferreira, OCG Microelectronic Materials, Inc. (United States)
Medhat A. Toukhy, OCG Microelectronic Materials, Inc. (United States)
Patricia Morra, OCG Microelectronic Materials, Inc. (United States)
Nicholas M. Reynolds, Molecular Simulations, Inc. (United States)


Published in SPIE Proceedings Vol. 2438:
Advances in Resist Technology and Processing XII
Robert D. Allen, Editor(s)

© SPIE. Terms of Use
Back to Top