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Proceedings Paper

Direct evaluation of airborne contamination in chemically amplified resist films
Author(s): Yoshio Yamashita; Takao Taguchi; Takeo Watanabe
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Paper Abstract

Airborne contamination in chemically amplified resist films was evaluated by monitoring deprotection reaction using an IR spectrometer. T-BOC protected (20, 50 and 100 mol%) m- and p-cresol novolak resins and triphenyltriflate were used as a matrix polymer and a photoacid generator (PAG), respectively. Three levels of clean environments whose base contaminant (NH4+) concentrations were 50 - 80, 5 - 10 and less than 1 ppb, were prepared for the experiments. In order to determine the delay effects precisely, other processes including baking, exposure, and storage during process intervals were conducted in a base-free environment. The PEB delay effect as well as radiation sensitivity without delay depended on the t-BOC content, and the best results were obtained at 50% and 25 - 50% t- BOC contents in m-cresol novolak and p-cresol novolak systems, respectively.

Paper Details

Date Published: 9 June 1995
PDF: 9 pages
Proc. SPIE 2438, Advances in Resist Technology and Processing XII, (9 June 1995); doi: 10.1117/12.210385
Show Author Affiliations
Yoshio Yamashita, SORTEC Corp. (Japan)
Takao Taguchi, SORTEC Corp. (Japan)
Takeo Watanabe, SORTEC Corp. (Japan)


Published in SPIE Proceedings Vol. 2438:
Advances in Resist Technology and Processing XII
Robert D. Allen, Editor(s)

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