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Proceedings Paper

Chemically amplified resist convertible into inorganic silicate glass (GPR)
Author(s): Miwa Sakata; Maki Kosuge; Hideyuki Jinbo; Toshio Ito
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Paper Abstract

We have developed a unique chemically amplified negative-type resist composed of poly(t- butoxysiloxane) and photoacid generator, the GPR (glass precursor resist), which can be converted into inorganic silicate glass. Poly(t-butoxysiloxane) is a specially designed SiO2 precursor masked by t-butoxyl groups. To confirm the mechanism of condensation to SiO2 an intermediate trapping experiment was carried out. GPR exposed at a low dose is fully developed by alkaline solution to give a positive tone; on the other hand, high-dosage GPR gives negative tone by means of organic solvent development. They correspond to the formation of poly(hydroxysilane) and SiO2 respectively. Deprotection proceeds readily even at low temperature, whereas condensation requires thermal assistance. Decreasing the content of t-butoxyl groups enhances the sensitivities to electron beam exposure. Precursor polymers with several degrees of branching were synthesized. The high-branching polymer provides high sensitivity because its network grows abruptly with condensation. GPR has high resolution and high sensitivity. The fine patterns can be resolved with the practical dose latitude using an electron beam direct-writing system.

Paper Details

Date Published: 9 June 1995
PDF: 12 pages
Proc. SPIE 2438, Advances in Resist Technology and Processing XII, (9 June 1995); doi: 10.1117/12.210370
Show Author Affiliations
Miwa Sakata, Oki Electric Industry Co., Ltd. (Japan)
Maki Kosuge, Oki Electric Industry Co., Ltd. (Japan)
Hideyuki Jinbo, Oki Electric Industry Co., Ltd. (Japan)
Toshio Ito, Oki Electric Industry Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 2438:
Advances in Resist Technology and Processing XII
Robert D. Allen, Editor(s)

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