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Proceedings Paper

Thick film photoresist resolution enhancement with surfactant surface treatment
Author(s): Dennis R. McKean; Thomas P. Russell; Alfred F. Renaldo
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Paper Abstract

A method for thick film photoresist resolution enhancement was investigated which involves treatment of photoresist films with solutions of cationic surfactants prior to development. By utilizing a surfactant surface treatment process, resist contrast is improved and better image resolution can be achieved. The effectiveness of the surfactant treatment is dependent on a number of factors including structure and concentration of surfactant, pH of the solution, mode and duration of treatment, and effect of other additives. The mechanism of the process has been investigated and the results suggest that the critical factors are the attachment of the surfactant to the top surface of the resist and the detachment of surfactant depending on film acid concentration.

Paper Details

Date Published: 9 June 1995
PDF: 12 pages
Proc. SPIE 2438, Advances in Resist Technology and Processing XII, (9 June 1995); doi: 10.1117/12.210365
Show Author Affiliations
Dennis R. McKean, IBM Corp. (United States)
Thomas P. Russell, IBM Corp. (United States)
Alfred F. Renaldo, IBM Corp. (United States)


Published in SPIE Proceedings Vol. 2438:
Advances in Resist Technology and Processing XII
Robert D. Allen, Editor(s)

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