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Proceedings Paper

Effect of basic additives on sensitivity and diffusion of acid in chemical amplification resists
Author(s): Koji Asakawa; Tohru Ushirogouchi; Makoto Nakase
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Paper Abstract

The effect of amine additives in chemical amplification resists is discussed. Phenolic amines such as 4-aminophenol and 2-(4-aminophenyl)-2-(4-hydroxyphenyl) propane were investigated as model compounds from the viewpoint of sensitivity, diffusion and resolution. Equal molar amounts of acid and amine deactivated at the very beginning of post-exposure bake, and could not participate in decomposing the inhibitor as a catalyst. Only the acid which survived from the deactivation diffuses in the resist, decomposing the inhibitors from the middle to late stage of PEB. The basic additives reduce the diffusion range of the acid, especially for long-range diffusion, resulting in higher contrast at the interfaces between the exposed and unexposed areas. In addition, the amine concentration required is found to be less than the concentration which causes the resist sensitivity to start decreasing.

Paper Details

Date Published: 9 June 1995
PDF: 8 pages
Proc. SPIE 2438, Advances in Resist Technology and Processing XII, (9 June 1995); doi: 10.1117/12.210361
Show Author Affiliations
Koji Asakawa, Toshiba Corp. (Japan)
Tohru Ushirogouchi, Toshiba Corp. (Japan)
Makoto Nakase, Toshiba Corp. (Japan)


Published in SPIE Proceedings Vol. 2438:
Advances in Resist Technology and Processing XII
Robert D. Allen, Editor(s)

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