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Proceedings Paper

Environmentally stable chemically amplified resist effects of organic salt additives
Author(s): Ei Yano; Yohko Kuramitsu; Keiji Watanabe; Takahisa Namiki; Koji Nozaki; Miwa Igarashi
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Paper Abstract

Incorporation of organic salt additives consisting of an organic acid and organic base improves the resist stability. The sensitivity of a t-BOC resist without the salt decreased to 1/4 after standing for one hour after deep-UV exposure. Typical T-top patterns were obtained on this resist by a KrF excimer laser stepper (NA equals 0.45), and a half-micron resolution was barely obtained. On the other hand, a t-BOC resist, with an organic salt, consisting of p- toluenesulfonic acid and dicyclohexylamine (PTS/DCHA), showed no change in sensitivity after one hour. The resist with the PTS/DCHA achieved a 0.3-micrometers resolution line-and- space pattern without environmental control or a protective topcoat.

Paper Details

Date Published: 9 June 1995
PDF: 12 pages
Proc. SPIE 2438, Advances in Resist Technology and Processing XII, (9 June 1995); doi: 10.1117/12.210360
Show Author Affiliations
Ei Yano, Fujitsu Labs. Ltd. (Japan)
Yohko Kuramitsu, Fujitsu Labs. Ltd. (Japan)
Keiji Watanabe, Fujitsu Labs. Ltd. (Japan)
Takahisa Namiki, Fujitsu Labs. Ltd. (Japan)
Koji Nozaki, Fujitsu Labs. Ltd. (Japan)
Miwa Igarashi, Fujitsu Labs. Ltd. (Japan)


Published in SPIE Proceedings Vol. 2438:
Advances in Resist Technology and Processing XII
Robert D. Allen, Editor(s)

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