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Proceedings Paper

Effect of PAC structure and resist morphology on the control of surface inhibition in positive photoresist systems
Author(s): Bernard T. Beauchemin; Rodney J. Hurditch; Medhat A. Toukhy; Andrew J. Blakeney
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Paper Abstract

The influence of PAC structure and morphology on the surface induction in novolak based resist systems was investigated. Variation in surface induction for a given PAC is caused by changes in the morphology between the surface and the bulk of the resist film resulting from solvent depletion and is characteristic of the novolak. PAC structure, particularly its functionality [i.e., maximum amount of diazonaphthoqunione (DNQ) esterifiable OH], was found to greatly influence the amount of surface inhibition.

Paper Details

Date Published: 9 June 1995
PDF: 12 pages
Proc. SPIE 2438, Advances in Resist Technology and Processing XII, (9 June 1995); doi: 10.1117/12.210349
Show Author Affiliations
Bernard T. Beauchemin, OCG Microelectronic Materials, Inc. (United States)
Rodney J. Hurditch, OCG Microelectronic Materials, Inc. (United States)
Medhat A. Toukhy, OCG Microelectronic Materials, Inc. (United States)
Andrew J. Blakeney, OCG Microelectronic Materials, Inc. (United States)


Published in SPIE Proceedings Vol. 2438:
Advances in Resist Technology and Processing XII
Robert D. Allen, Editor(s)

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