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Proceedings Paper

Formulation and modeling of dyed positive i-line resist for control of the reflective notching and CD variation
Author(s): Marina V. Plat; William R. Brunsvold; Randolph S. Smith; Nicholas K. Eib; Christopher F. Lyons
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Paper Abstract

This study evaluates the effect of dyes, including photosensitive dyes, on resist performance such as: swing curve reduction, resist dissolution rate, resolution, dose and focus latitude, scumming, etc. The paper demonstrates good correlation between modeling of the dyed resist performance and experimental results.

Paper Details

Date Published: 9 June 1995
PDF: 9 pages
Proc. SPIE 2438, Advances in Resist Technology and Processing XII, (9 June 1995); doi: 10.1117/12.210348
Show Author Affiliations
Marina V. Plat, IBM Corp. (United States)
William R. Brunsvold, IBM Corp. (United States)
Randolph S. Smith, IBM Corp. (United States)
Nicholas K. Eib, IBM Corp. (United States)
Christopher F. Lyons, IBM Corp. (United States)

Published in SPIE Proceedings Vol. 2438:
Advances in Resist Technology and Processing XII
Robert D. Allen, Editor(s)

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