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Proceedings Paper

Performance properties of near-monodisperse novolak resins
Author(s): Robert D. Allen; K. Rex Chen; Paula M. Gallagher-Wetmore
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Paper Abstract

Novolak resins are the most complex and important polymers used in photoresists for microlithography. We have developed methods for fractionation of novolak resins based on supercritical fluid technology to afford polymers with molecular weights distributions (MW/MN) approaching 1.0. Properties (glass transition, dissolution, and lithographic) of monodisperse novolak resins demonstrate extremely exaggerated molecular weight effects. I- line resists formulated from these ultra-fractionated resins show extraordinarily diverse lithographic properties, ranging from low-to-high contrast, the absence or presence of microgrooving and residue, and photospeed and thermal properties that are highly controllable. Ultimately, a prototype resist formulation based on mixtures of fractions combining high resolution (0.35 microns) and fast photospeed (125 mJ/cm2) was demonstrated. New rules for the influence of novolak molecular weight on photoresist performance are presented.

Paper Details

Date Published: 9 June 1995
PDF: 11 pages
Proc. SPIE 2438, Advances in Resist Technology and Processing XII, (9 June 1995); doi: 10.1117/12.210346
Show Author Affiliations
Robert D. Allen, IBM Almaden Research Ctr. (United States)
K. Rex Chen, IBM Microelectronics Div. (United States)
Paula M. Gallagher-Wetmore, Phasex Corp. (United States)

Published in SPIE Proceedings Vol. 2438:
Advances in Resist Technology and Processing XII
Robert D. Allen, Editor(s)

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