Share Email Print

Proceedings Paper

SEMATECH and the national technology roadmap: needs and challenges
Author(s): Karen H. Brown
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

In 1994, The National Technology Roadmap for Semiconductors was revised, updated to reflect the latest information, and published in December 1994. Lithography continues to be a cornerstone for semiconductor process and productivity. The roadmap activity is sponsored by the SIA. The Technical Working Group (TWG), which does the actual work of updating the roadmap, is comprised of members from SEMATECH, SEMATECH FTABs, SRC, industry, universities and government. One of SEMATECH's key goals is to insure that the activities we pursue are well-aligned to the roadmap. The roadmap is focused on requirements and needs of the industry. SEMATECH is focused on solutions. The lithography roadmap makes clear the desire of semiconductor manufacturers to stay with optics as long as possible since shifts to non-optical technology are viewed as much higher investment and risk. It is perceived that optics can be a viable manufacturing solution through at least the 0.18 micrometers generation. The TWG and SEMATECH FTAB meetings highlighted the need for greatly increased emphasis and resources on 193 nm technology to bring it to pilot production in 1998 for the 0.18 micrometers generation. SEMATECH has since worked with the industry to define more detailed needs and requirements for a successful 193 program and is working with industry and the government to insure that the technology is available when needed in manufacturing. The needs are clear...cost-effective lithography for each generation. The challenges to get there from here.

Paper Details

Date Published: 9 June 1995
PDF: 5 pages
Proc. SPIE 2438, Advances in Resist Technology and Processing XII, (9 June 1995); doi: 10.1117/12.210343
Show Author Affiliations
Karen H. Brown, SEMATECH (United States)

Published in SPIE Proceedings Vol. 2438:
Advances in Resist Technology and Processing XII
Robert D. Allen, Editor(s)

© SPIE. Terms of Use
Back to Top