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Proceedings Paper

Epitaxial Pb(ZrxTi1-x)O3/SrRuO3 (x=0,0.35,0.65) multilayer thin films on SrTiO3(100) and MgO(100) prepared by MOCVD and rf sputtering
Author(s): Christopher M. Foster; Roseann Csencsits; Peter M. Baldo; Guo-Ren Bai; Li Zhuang; Lynn E. Rehn; L. A. Wills-Mirkarimi; Ron R. Hiskes
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Paper Abstract

Epitaxial SrRuO3 thin films were deposited on SrTiO3(100) and MgO(100) substrates by rf sputtering for use as bottom electrodes and epitaxial buffer layers. On these conductive substrates, epitaxial Pb(ZrxTi1-x)O3 (PZT; x equals 0.35, 0.65) and PbTiO3 (PT; x equals 0) thin films were deposited by metalorganic chemical vapor deposition (MOCVD). X-ray diffraction (XRD), RBS channeling (RBS), transmission electron microscopy (TEM) and optical waveguiding were used to characterize the phase, microstructure, defect structure, refractive index, and film thickness of the deposited films. The PZT and PT films were epitaxial and c-axis oriented. Ninety degree domains, interfacial misfit dislocations and threading dislocations were the primary structural defects, and the films showed as high as 70% RBS channeling reduction. Ferroelectric hysteresis and dielectric measurements of epitaxial PZT ferroelectric capacitor structures formed using evaporated Ag top electrode showed: a remanent polarization of 46.2 (mu) C/cm2, a coercive field of 54.9 kV/cm, a dielectric constant of 410, a bipolar resistivity of approximately 5.8 X 109 (Omega) -cm at a field of 275 kV/cm, and a breakdown strength of > 400 kV/cm. Cyclic fatigue measurements showed that the remanent polarization was maintained for > 109 cycles.

Paper Details

Date Published: 22 May 1995
PDF: 12 pages
Proc. SPIE 2441, Smart Structures and Materials 1995: Smart Materials, (22 May 1995); doi: 10.1117/12.209806
Show Author Affiliations
Christopher M. Foster, Argonne National Lab. (United States)
Roseann Csencsits, Argonne National Lab. (United States)
Peter M. Baldo, Argonne National Lab. (United States)
Guo-Ren Bai, Argonne National Lab. (United States)
Li Zhuang, Argonne National Lab. (United States)
Lynn E. Rehn, Argonne National Lab. (United States)
L. A. Wills-Mirkarimi, Hewlett-Packard Co. (United States)
Ron R. Hiskes, Hewlett-Packard Co. (United States)


Published in SPIE Proceedings Vol. 2441:
Smart Structures and Materials 1995: Smart Materials
A. Peter Jardine, Editor(s)

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