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Proceedings Paper

Total overlay analysis for designing future aligner
Author(s): Nobutaka Magome; Hidemi Kawai
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Paper Abstract

We found total overlay with respect to optical lithography using an approach similar to quality control technique employed at a semiconductor factory. This approach involves an aligner performance, process quality, reticle error and overlay measurement. This paper further describes new ides for the number of machines to be used for matching and data collection period. Lastly, improvement on total overlay and a prospective view for a future aligner and its usage are also described.

Paper Details

Date Published: 26 May 1995
PDF: 11 pages
Proc. SPIE 2440, Optical/Laser Microlithography VIII, (26 May 1995); doi: 10.1117/12.209316
Show Author Affiliations
Nobutaka Magome, Nikon Corp. (Japan)
Hidemi Kawai, Nikon Corp. (Japan)

Published in SPIE Proceedings Vol. 2440:
Optical/Laser Microlithography VIII
Timothy A. Brunner, Editor(s)

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