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Proceedings Paper

Contributions of stepper lenses to systematic CD errors within exposure fields
Author(s): Hua-Yu Liu; Crid Yu; Robert E. Gleason
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Paper Abstract

We have studied systematic line width (CD) errors as functions of field coordinates for three late-model i-line steppers from different manufacturers by measuring electrical resistance of lines patterned in poly-silicon. The combination of reticle errors with non-linear imaging accounts for a significant fraction of the total line width errors. After removing the effects of reticle errors, CD contour maps are consistent with aberration patterns in which the Strehl intensity is highest at the center of the field.

Paper Details

Date Published: 26 May 1995
PDF: 10 pages
Proc. SPIE 2440, Optical/Laser Microlithography VIII, (26 May 1995); doi: 10.1117/12.209312
Show Author Affiliations
Hua-Yu Liu, Hewlett-Packard Co. (United States)
Crid Yu, Univ. of California/Berkeley (United States)
Robert E. Gleason, Hewlett-Packard Co. (United States)

Published in SPIE Proceedings Vol. 2440:
Optical/Laser Microlithography VIII
Timothy A. Brunner, Editor(s)

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