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Proceedings Paper

Investigation of lithography yield-loss issues from focusing/leveling system of advance stepper
Author(s): Daniel Hao-Tien Lee; Chia-Jen Cheng; Tah-Te Shih
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Paper Abstract

Three types of dies on the wafer including dies on wafer edge, dies adjacent to testkey patterns, and dies with asymmetric chip layout have been identified for mistilting on the lithography exposure processes. There are several approaches i.e. dummy die exposed on the wafer edge, various focus offset, and pattern layout modification etc. can alleviate this problem. However, to complete solve these issues rely on the fundamental and methodical improvements on the stepper leveling system and control software.

Paper Details

Date Published: 26 May 1995
PDF: 8 pages
Proc. SPIE 2440, Optical/Laser Microlithography VIII, (26 May 1995); doi: 10.1117/12.209311
Show Author Affiliations
Daniel Hao-Tien Lee, ERSO/ITRI (Taiwan)
Chia-Jen Cheng, ERSO/ITRI (Taiwan)
Tah-Te Shih, ERSO/ITRI (Taiwan)


Published in SPIE Proceedings Vol. 2440:
Optical/Laser Microlithography VIII
Timothy A. Brunner, Editor(s)

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