Share Email Print

Proceedings Paper

Optimum combination of source, mask, and filter for better lithographic performance
Author(s): Hye-Keun Oh; Jeong-Ung Koo; Young-Min Cho; Byung-Sun Park; Hai Bin Chung; Hyung Joun Yoo
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

We have tried to find optimum combinations of source, mask and pupil filter suitable for all kinds of mask pattern with critical dimension (CD) of 0.18 micrometers by aerial image simulation. The annular aperture radii of deep UV source (wavelength 193 nm) are controlled to give optimum annular illumination for equal line/space pattern. The optimized illumination aperture has inner radius of (sigma) in equals 0.525 and outer radius of (sigma) out equals 0.600. Under this illumination, various transmittances of halftone mask are investigated as mask variation and phase distribution of pupil filter is modulated annularly. The aerial image characteristics are compared among eight combinations of illumination, mask, and filter in order to find the most effective combination for each typical mask pattern such as equal line/space, isolated line, isolated space and contact hole. The effective method is annular illumination for line/space, pupil filter for the other patterns. The combination of annular illumination + binary intensity mask + pupil filter is recommended for simultaneous printing of all kinds of pattern.

Paper Details

Date Published: 26 May 1995
PDF: 12 pages
Proc. SPIE 2440, Optical/Laser Microlithography VIII, (26 May 1995); doi: 10.1117/12.209309
Show Author Affiliations
Hye-Keun Oh, Han-Yang Univ. (South Korea)
Jeong-Ung Koo, Han-Yang Univ. (South Korea)
Young-Min Cho, Han-Yang Univ. (South Korea)
Byung-Sun Park, Electronics and Telecommunications Research Institute (South Korea)
Hai Bin Chung, Electronics and Telecommunications Research Institute (South Korea)
Hyung Joun Yoo, Electronics and Telecommunications Research Institute (South Korea)

Published in SPIE Proceedings Vol. 2440:
Optical/Laser Microlithography VIII
Timothy A. Brunner, Editor(s)

© SPIE. Terms of Use
Back to Top