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Proceedings Paper

KrF excimer laser with repetition rates of 1 kHz for DUV lithography
Author(s): Rainer Paetzel; Juergen Kleinschmidt; Ulrich Rebhan; Jim Franklin; Heinrich Endert
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Paper Abstract

Advanced DUV lithography tools are adapting scanning methods in order to match the increasing demands on throughput, field size, and resolution. The demands on the laser source are changing for both the reflective and the refractive Step&Scan tools. The cost-effective operation of such lithography tool requires 248 nm excimer laser with high power and repetition rates of >= 1 kHz. Precise dose control of the exposure demands not only high repetition rates but also excellent stability of the laser output energy. The combination of the new NovaTube technology laser tube design with the LITHO line narrowing optics design allows 1 kHz operation of the excimer laser with high stability.

Paper Details

Date Published: 26 May 1995
PDF: 5 pages
Proc. SPIE 2440, Optical/Laser Microlithography VIII, (26 May 1995); doi: 10.1117/12.209305
Show Author Affiliations
Rainer Paetzel, Lambda Physik GmbH (Germany)
Juergen Kleinschmidt, Lambda Physik GmbH (Germany)
Ulrich Rebhan, Lambda Physik GmbH (Germany)
Jim Franklin, Lambda Physik GmbH (Germany)
Heinrich Endert, Lambda Physik GmbH (Germany)


Published in SPIE Proceedings Vol. 2440:
Optical/Laser Microlithography VIII
Timothy A. Brunner, Editor(s)

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