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Proceedings Paper

In-situ optimization of an i-line optical projection lens
Author(s): Chunsheng Huang
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Paper Abstract

An in-situ process has been developed to optimize lens element alignment on a wafer stepper. This technique evaluates and analyzed the optical wavefront using the photoresist line and space profile. The advantage of this technique is that the photoresist sensitivity to the optical wavefront of the lens is automatically considered in the optimization process. The technique uses theoretical prediction and empirical critical dimension (CD) data to adjust the projection lens for optimum performance on the stepper. Successful implementation in production has been achieved. While the procedure has been developed on a high efficiency 1X projection lens, it can also be implemented on a reduction lens.

Paper Details

Date Published: 26 May 1995
PDF: 9 pages
Proc. SPIE 2440, Optical/Laser Microlithography VIII, (26 May 1995); doi: 10.1117/12.209300
Show Author Affiliations
Chunsheng Huang, Ultratech Stepper (United States)

Published in SPIE Proceedings Vol. 2440:
Optical/Laser Microlithography VIII
Timothy A. Brunner, Editor(s)

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