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Proceedings Paper

Automatic laser-scanning focus detection method using printed focus pattern
Author(s): Kyoichi Suwa; Hiroki Tateno; Nobuyuki Irie; Shigeru Hirukawa
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Paper Abstract

An innovative method of determining best focus with an optical exposure tool has been developed. The method uses wedge shaped marks in photoresist that can be measured automatically. The results show that best focus can be measured with a repeatability of 20 nm. The automatic focus measurement system can be used to characterize lens astigmatism, field curvature and tilt. Data shows good correlation with conventional methods using SEM linewidth measurement.

Paper Details

Date Published: 26 May 1995
PDF: 9 pages
Proc. SPIE 2440, Optical/Laser Microlithography VIII, (26 May 1995); doi: 10.1117/12.209298
Show Author Affiliations
Kyoichi Suwa, Nikon Precision Inc. (Japan)
Hiroki Tateno, Nikon Corp. (Japan)
Nobuyuki Irie, Nikon Corp. (Japan)
Shigeru Hirukawa, Nikon Corp. (Japan)

Published in SPIE Proceedings Vol. 2440:
Optical/Laser Microlithography VIII
Timothy A. Brunner, Editor(s)

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