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Proceedings Paper

New system for fast submicron laser direct writing
Author(s): Heinz Kueck; Michael Bollerott; Wolfgang Doleschal; Andreas Gehner; Wolfram Grundke; Detlef Kunze; Rolf Melcher; Joerg Paufler; Rolf Seltmann; Guenter Zimmer
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Paper Abstract

We report on a new system for submicron lithography by fast laser direct writing, where a programmable phase modulating spatial light modulator (SLM) is imaged onto the wafer using flash on the fly exposure with an excimer laser light source. This new principle for maskless optical lithography has been investigated for the first time. A SLM with 512 X 464 pixels has been developed and fabricated using a CMOS active matrix and a reflective, deformable viscoelastic layer on top. Using this light modulator for image generation a demonstrator exposure tool for 0.6 micrometers minimum feature size has been designed and set up including all the components necessary for the exposure of a complete lithographic layer from CAD layout data. The demonstrator is shown to give good quality photoresist pattern on the wafer at a throughput of roughly one 4"-wafer per hour. Based on our experimental results we propose a tool with a throughput of nine 6"-wafers per hour and conclude that the new principle of operation has the potential of high performance optical direct writing lithography.

Paper Details

Date Published: 26 May 1995
PDF: 9 pages
Proc. SPIE 2440, Optical/Laser Microlithography VIII, (26 May 1995); doi: 10.1117/12.209280
Show Author Affiliations
Heinz Kueck, Fraunhofer Institute of Microelectronic Circuits and Systems (Germany)
Michael Bollerott, Fraunhofer Institute of Microelectronic Circuits and Systems (Germany)
Wolfgang Doleschal, Fraunhofer Institute of Microelectronic Circuits and Systems (Germany)
Andreas Gehner, Fraunhofer Institute of Microelectronic Circuits and Systems (Germany)
Wolfram Grundke, Fraunhofer Institute of Microelectronic Circuits and Systems (Germany)
Detlef Kunze, Fraunhofer Institute of Microelectronic Circuits and Systems (Germany)
Rolf Melcher, Fraunhofer Institute of Microelectronic Circuits and Systems (Germany)
Joerg Paufler, Fraunhofer Institute of Microelectronic Circuits and Systems (Germany)
Rolf Seltmann, Fraunhofer Institute of Microelectronic Circuits and Systems (Germany)
Guenter Zimmer, Fraunhofer Institute of Microelectronic Circuits and Systems (Germany)


Published in SPIE Proceedings Vol. 2440:
Optical/Laser Microlithography VIII
Timothy A. Brunner, Editor(s)

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