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Proceedings Paper

Efficient 3D phase-shifting mask lithography simulation
Author(s): Kevin D. Lucas; Andrzej J. Strojwas; Hiroyoshi Tanabe
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Paper Abstract

Rigorous simulation has been shown to be useful for predicting complicated effects in the optical lithography process. Rigorous simulation models are necessary for accurately predicting behavior from non planar mask and substrate structures and for non-vertical light propagation. As previously shown[l], the benefits of 2D rigorous lithography simulation are many, however, these models are inherently limited. 2D models are not general enough to model contact openings, corners, 3D defect structures or off-axis illumina tion systems. These are important issues in lithography today and require true 3D simulation to help analyze them.

Paper Details

Date Published: 26 May 1995
PDF: 13 pages
Proc. SPIE 2440, Optical/Laser Microlithography VIII, (26 May 1995); doi: 10.1117/12.209273
Show Author Affiliations
Kevin D. Lucas, Carnegie Mellon Univ. (United States)
Andrzej J. Strojwas, Carnegie Mellon Univ. (United States)
Hiroyoshi Tanabe, NEC Corp. (Japan)

Published in SPIE Proceedings Vol. 2440:
Optical/Laser Microlithography VIII
Timothy A. Brunner, Editor(s)

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