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Proceedings Paper

Automated layout of mask assist-features for realizing 0.5 k1 ASIC lithography
Author(s): Joseph G. Garofalo; Oberdan W. Otto; Raymond A. Cirelli; Robert L. Kostelak; Sheila Vaidya
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Paper Abstract

The virtues of mask-plane assist features for improving imaging performance of generic ASIC layouts in the 0.5k1 realm has been previously proclaimed. In this report we provide experimental verification and introduce a methodology to automatically deploy these features on ASIC layouts.

Paper Details

Date Published: 26 May 1995
PDF: 11 pages
Proc. SPIE 2440, Optical/Laser Microlithography VIII, (26 May 1995); doi: 10.1117/12.209262
Show Author Affiliations
Joseph G. Garofalo, AT&T Bell Labs. (United States)
Oberdan W. Otto, Trans Vector Technologies Inc. (United States)
Raymond A. Cirelli, AT&T Bell Labs. (United States)
Robert L. Kostelak, AT&T Bell Labs. (United States)
Sheila Vaidya, AT&T Bell Labs. (United States)


Published in SPIE Proceedings Vol. 2440:
Optical/Laser Microlithography VIII
Timothy A. Brunner, Editor(s)

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