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Proceedings Paper

Fast optical proximity correction: analytical method
Author(s): Satomi Shioiri; Hiroyoshi Tanabe
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Paper Abstract

In automating optical proximity correction, calculation speed becomes important. In this paper we present a novel method for calculating proximity corrected features analytically. The calculation will take only several times the amount it takes to calculate intensity of one point on wafer. Therefore, the calculation will become extremely faster than conventional repetitive aerial image calculations. This method is applied to a simple periodic pattern. The simulated results show great improvement on linearity after correction and have proved the effectiveness of this analytical method.

Paper Details

Date Published: 26 May 1995
PDF: 9 pages
Proc. SPIE 2440, Optical/Laser Microlithography VIII, (26 May 1995); doi: 10.1117/12.209258
Show Author Affiliations
Satomi Shioiri, NEC Corp. (Japan)
Hiroyoshi Tanabe, NEC Corp. (Japan)

Published in SPIE Proceedings Vol. 2440:
Optical/Laser Microlithography VIII
Timothy A. Brunner, Editor(s)

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