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Proceedings Paper

Step and scan: the maturing technology
Author(s): Harry Sewell
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Paper Abstract

This paper reviews the status of step-and-scan technology. It reviews the main features of the technology and highlights its advantages over the conventional step-and-repeat technology. Data is presented to show the superior field distortion, linewidth control, and overlay performance offered by step-and-scan. The future direction of the technology is discussed in the context of the Semiconductor Industry Association (SIA) roadmap. It is indicated that the step-and-scan technique will allow optical lithography to extend below 180 nm resolution.

Paper Details

Date Published: 26 May 1995
PDF: 12 pages
Proc. SPIE 2440, Optical/Laser Microlithography VIII, (26 May 1995); doi: 10.1117/12.209256
Show Author Affiliations
Harry Sewell, SVG Lithography Systems Inc. (United States)

Published in SPIE Proceedings Vol. 2440:
Optical/Laser Microlithography VIII
Timothy A. Brunner, Editor(s)

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