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Proceedings Paper

Study of optical proximity effects using off-axis illumination with attenuated phase shift mask
Author(s): Chang-Nam Ahn; Ki-Ho Baik; Yong-Suk Lee; Hung-Eil Kim; Ikboum Hur; YoungSik Kim; Ju-Hwan Kim; Soo-Han Choi
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Paper Abstract

The global proximity effects of densed line, semi-isolated line are studied for conventional illumination, off-axis illumination, and finally off-axis illumination in combination with attenuated phase shift masks which have transmittance of 4% and 8%, respectively, by experiments and simulations. To analyze the behavior of proximity effects, the lithographic performances of the super resolution technique are investigated comparing the cross-sectional view of resist pattern profile, useful depth of focus, and the curves of linewidth vs. defocus for 0.30 micrometers , 0.35 micrometers , and 0.40 micrometers pattern size, respectively. The global proximity effect is quantitatively analyzed by fitting the curve for densed line and isolated line to 2nd order polynomials. Off- axis illumination with attenuated phase shift mask is very effective to minimize the proximity effects for the pattern size less than 0.40 micrometers , and have useful depth of focus of 1.0 micrometers for 0.30 micrometers patterns.

Paper Details

Date Published: 26 May 1995
PDF: 18 pages
Proc. SPIE 2440, Optical/Laser Microlithography VIII, (26 May 1995); doi: 10.1117/12.209254
Show Author Affiliations
Chang-Nam Ahn, Hyundai Electronics Industries Co., Ltd. (South Korea)
Ki-Ho Baik, Hyundai Electronics Industries Co., Ltd. (South Korea)
Yong-Suk Lee, Hyundai Electronics Industries Co., Ltd. (South Korea)
Hung-Eil Kim, Hyundai Electronics Industries Co., Ltd. (South Korea)
Ikboum Hur, Hyundai Electronics Industries Co., Ltd. (South Korea)
YoungSik Kim, Hyundai Electronics Industries Co., Ltd. (South Korea)
Ju-Hwan Kim, Hyundai Electronics Industries Co., Ltd. (South Korea)
Soo-Han Choi, Hyundai Electronics Industries Co., Ltd. (South Korea)


Published in SPIE Proceedings Vol. 2440:
Optical/Laser Microlithography VIII
Timothy A. Brunner, Editor(s)

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