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Proceedings Paper

Practical evaluation of optical-proximity effect correction by EDM methodology
Author(s): Minoru Sugawara; Hiroichi Kawahira; Keisuke Tsudaka; Satoru Nozawa
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Paper Abstract

Practical evaluation method for optical proximity effect correction (OPC) feasibility is newly proposed using EDM (Exposure-Defocus and Mask fabrication latitude) methodology. In this method, printed image on a wafer is characterized by process latitude functions derived from EDM methodology in terms of exposure latitude, depth of focus, and mask line width latitude. In this paper, effectiveness of the process latitude functions will be verified by applying them to intraproximity effect evaluation for isolated lines and angled lines, and also to interproximity effect evaluation for T-shaped patterns and lines & spaces (L/S) patterns in i-line lithography.

Paper Details

Date Published: 26 May 1995
PDF: 13 pages
Proc. SPIE 2440, Optical/Laser Microlithography VIII, (26 May 1995); doi: 10.1117/12.209253
Show Author Affiliations
Minoru Sugawara, Sony Corp. (Japan)
Hiroichi Kawahira, Sony Corp. (Japan)
Keisuke Tsudaka, Sony Corp. (Japan)
Satoru Nozawa, Sony Corp. (Japan)


Published in SPIE Proceedings Vol. 2440:
Optical/Laser Microlithography VIII
Timothy A. Brunner, Editor(s)

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