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Proceedings Paper

Integrating proximity effect corrections with photomask data preparation
Author(s): Oberdan W. Otto; Richard C. Henderson
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Paper Abstract

In an earlier work we demonstrated the feasibility of automated software correction for imaging and process proximity effects by precompensating mask layout data. As correction techniques and algorithms continue to be refined, it is important to deal with integrating the correction computation into the manufacturing data flow. This paper addresses issues such as computational speed, data volumes, management of the data hierarchy, and the need for geometric operations between various CAD layers within the context of a data hierarchy manager.

Paper Details

Date Published: 26 May 1995
PDF: 8 pages
Proc. SPIE 2440, Optical/Laser Microlithography VIII, (26 May 1995); doi: 10.1117/12.209251
Show Author Affiliations
Oberdan W. Otto, Trans Vector Technologies Inc. (United States)
Richard C. Henderson, Trans Vector Technologies Inc. (United States)

Published in SPIE Proceedings Vol. 2440:
Optical/Laser Microlithography VIII
Timothy A. Brunner, Editor(s)

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