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Proceedings Paper

Deep-UV lithography using continuous-wave 266-nm radiation from an all solid state frequency quadrupled Nd:YAG laser
Author(s): Hiroshi Suganuma; Minoru Takeda; Michio Oka; Naoto Ozaki; Motohisa Haga; Shigeo R. Kubota
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Paper Abstract

A new lithography technique using continuous wave (CW) 266 nm radiation from an all solid state frequency quadrupled Nd:YAG laser is described and demonstrated. This laser has proved to be a highly efficient and promising deep UV light source in fabrication of 0.25 micron design rule device. Furthermore, we obtained 0.2 micron L/S pattern with phase shift mask. Speckle free images are obtained with rotating diffuser. The performance and potential of this new laser as a light source of microlithography are discussed and compared with KrF excimer laser theoretically and experimentally.

Paper Details

Date Published: 26 May 1995
PDF: 10 pages
Proc. SPIE 2440, Optical/Laser Microlithography VIII, (26 May 1995); doi: 10.1117/12.209243
Show Author Affiliations
Hiroshi Suganuma, Sony Corp. (Japan)
Minoru Takeda, Sony Corp. (Japan)
Michio Oka, Sony Corp. (Japan)
Naoto Ozaki, Sony Corp. (Japan)
Motohisa Haga, Sony Corp. (Japan)
Shigeo R. Kubota, Sony Corp. (Japan)


Published in SPIE Proceedings Vol. 2440:
Optical/Laser Microlithography VIII
Timothy A. Brunner, Editor(s)

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