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Proceedings Paper

Metrology of etched quartz and chrome embedded phase shift gratings using scatterometry
Author(s): Susan M. Wilson; S. Sohail H. Naqvi; John Robert McNeil; Herschel M. Marchman; Blaine D. Johs; Roger H. French; Franklin D. Kalk
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Paper Details

Date Published: 22 May 1995
PDF: 16 pages
Proc. SPIE 2439, Integrated Circuit Metrology, Inspection, and Process Control IX, (22 May 1995); doi: 10.1117/12.209233
Show Author Affiliations
Susan M. Wilson, Univ. of New Mexico (United States)
S. Sohail H. Naqvi, Univ. of New Mexico (United States)
John Robert McNeil, Univ. of New Mexico (United States)
Herschel M. Marchman, AT&T Bell Labs. (United States)
Blaine D. Johs, J.A. Woollam Co., Inc. (United States)
Roger H. French, DuPont Central Science and Engineering (United States)
Franklin D. Kalk, DuPont Photomasks, Inc. (United States)


Published in SPIE Proceedings Vol. 2439:
Integrated Circuit Metrology, Inspection, and Process Control IX
Marylyn Hoy Bennett, Editor(s)

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