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Proceedings Paper

Multimode electron beam imaging and metrology
Author(s): Kevin M. Monahan
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Paper Abstract

In this work, we address the 0.25 micrometers yield management applications of multimode electron beam imaging using both backscattered and secondary electrons. The prospects for achieving aggressive performance specifications for quarter-micrometer process control in imaging, metrology and productivity are analyzed, and supporting examples are provided.

Paper Details

Date Published: 22 May 1995
PDF: 9 pages
Proc. SPIE 2439, Integrated Circuit Metrology, Inspection, and Process Control IX, (22 May 1995); doi: 10.1117/12.209217
Show Author Affiliations
Kevin M. Monahan, KLA Instruments Corp. (United States)


Published in SPIE Proceedings Vol. 2439:
Integrated Circuit Metrology, Inspection, and Process Control IX
Marylyn Hoy Bennett, Editor(s)

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