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Proceedings Paper

Micromachining using Helios
Author(s): Dean Morris; Andreas Schmidt; Raul E. Acosta; Massimo Gentili; Romano Maggiora; David E. Andrews
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Paper Abstract

Micromachining using Deep Etch Lithography (the LIGA process) has been the subject of intensive research since the 1980's. Efforts are underway to produce a wide variety of microstructure products, from fuel injectors in the automobile industry to micropumps for high precision fluid delivery in the medical industry. This paper describes a successful demonstration of the patterning step of this process that was recently performed at the IBM Advanced Lithography Facility, East Fishkill, on Helios, the Oxford Instruments 0.7 GeV compact synchrotron. A number of test microstructures were produced in PMMA resist, including waveguides, micromotor components and miniature optical components. The critical dimensions in some of these test samples were below 2 micrometers . The required exposure times ranged from a few minutes for small areas, to a few hours for the largest areas (60 X 100 mm2) and thickest resists (500 micrometers ). The spectral requirements for achieving the desired results in varying thickness resists are discussed. The demonstration showed that Helios is well-suited as a source for micromachining, despite the fact that it was designed as an optimized source for conventional x-ray lithography, which requires a lower x-ray energy.

Paper Details

Date Published: 19 May 1995
PDF: 5 pages
Proc. SPIE 2437, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (19 May 1995); doi: 10.1117/12.209192
Show Author Affiliations
Dean Morris, Oxford Instruments Ltd. (United Kingdom)
Andreas Schmidt, IMM Institute of Microtechnology GmbH (Germany)
Raul E. Acosta, IBM Thomas J. Watson Research Ctr. (United States)
Massimo Gentili, CNR Institute for Electronics and Solid State (Italy)
Romano Maggiora, CNR Institute for Electronics and Solid State (Italy)
David E. Andrews, Oxford Superconducting Technology (United States)


Published in SPIE Proceedings Vol. 2437:
Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V
John M. Warlaumont, Editor(s)

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