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Proceedings Paper

Toward a commercial gas field ion source
Author(s): William B. Thompson; A. Armstrong; S. Etchin; Raymond Hill; Sigfried Kalbitzer; R. Percival; A. Saxonis; Christoph Wilbertz
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Paper Abstract

Focused ion beam systems have traditionally used liquid gallium as the ion source material. It may now be possible to have high current density focused beams of gas ions like hydrogen, helium, neon, and oxygen. This paper discusses the progress recently made toward the commercialization of an alternative to gallium, the gas field ion source, or GFIS.

Paper Details

Date Published: 19 May 1995
PDF: 7 pages
Proc. SPIE 2437, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (19 May 1995); doi: 10.1117/12.209185
Show Author Affiliations
William B. Thompson, Micrion Corp. (United States)
A. Armstrong, Micrion Corp. (United States)
S. Etchin, Micrion Corp. (United States)
Raymond Hill, Micrion Corp. (United States)
Sigfried Kalbitzer, Max-Planck-Institut fuer Kernphysik (Germany)
R. Percival, Micrion Corp. (United States)
A. Saxonis, Micrion Corp. (United States)
Christoph Wilbertz, Max-Planck-Institut fuer Kernphysik (Germany)


Published in SPIE Proceedings Vol. 2437:
Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V
John M. Warlaumont, Editor(s)

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