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Proceedings Paper

Repair of photo- and x-ray masks by LCVD using nitrogen laser
Author(s): Elena Fedorovna Reznikova; Vladimir V. Chesnokov; Galina I. Zharkova; Oleg A. Makarov; Vladimir P. Naz'mov; Igor K. Igumenov
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Paper Abstract

The use of laser-induced chemical vapor deposition (LCVD) of chromium and rhenium film patterns for reporting of photomask defects and LCVD of rhenium, gold and platinum film pattern for repairing similar defects of X-ray masks was demonstrated. Initial compounds were Cr(CO)6, Re2(CO)10, Me2Au(dpm) and Pt(hfa)2. The high marginal sharpness and the thickness uniformity of deposited films was provided by the use of powerful nanosecond pulse laser, the protective system for a delineation of a irradiation zone and the laser beam microscanning in limits of this zone. The scheme of the set for the direct laser deposition of film micropatterns was presented.

Paper Details

Date Published: 19 May 1995
PDF: 9 pages
Proc. SPIE 2437, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (19 May 1995); doi: 10.1117/12.209184
Show Author Affiliations
Elena Fedorovna Reznikova, Institute of Inorganic Chemistry (Russia)
Vladimir V. Chesnokov, Novosibirsk Institute of Engineeers of Geodesy (Russia)
Galina I. Zharkova, Institute of Inorganic Chemistry (Russia)
Oleg A. Makarov, Budker Institute of Nuclear Physics (Russia)
Vladimir P. Naz'mov, Institute of Inorganic Chemistry (Russia)
Igor K. Igumenov, Institute of Inorganic Chemistry (Russia)


Published in SPIE Proceedings Vol. 2437:
Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V
John M. Warlaumont, Editor(s)

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