Share Email Print
cover

Proceedings Paper

Creation of a topology in metal phthalocyanine layers
Author(s): Elena Fedorovna Reznikova; Stalina A. Prokhorova; T. V. Basova; B. M. Ajupov; Vladimir P. Naz'mov; I. A. Makarov; Igor K. Igumenov; Jurij H. Krieger
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

The influence of synchrotron radiation on the vacuum-deposited layers of copper and aluminum phthalocyanines was investigated. For creation of patterns in these layers the x-ray radiation exposing and vacuum thermal development were used. It was established that the layers of copper phthalocyanine possess the properties of both positive and negative vacuum x- ray resist upon radiation exposure of 5 kJ/cm3 and 35 kJ/cm3 accordingly. The layers of aluminum phthalocyanine possess the properties of only negative vacuum x-ray resists. The possibility of creating submicron topology in layers of metal phthalocyanines has been demonstrated.

Paper Details

Date Published: 19 May 1995
PDF: 9 pages
Proc. SPIE 2437, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (19 May 1995); doi: 10.1117/12.209179
Show Author Affiliations
Elena Fedorovna Reznikova, Institute of Inorganic Chemistry (Russia)
Stalina A. Prokhorova, Institute of Inorganic Chemistry (Russia)
T. V. Basova, Institute of Inorganic Chemistry (Russia)
B. M. Ajupov, Institute of Inorganic Chemistry (Russia)
Vladimir P. Naz'mov, Budker Institute of Nuclear Physics (Russia)
I. A. Makarov, Budker Institute of Nuclear Physics (Russia)
Igor K. Igumenov, Institute of Inorganic Chemistry (Russia)
Jurij H. Krieger, Institute of Inorganic Chemistry (Russia)


Published in SPIE Proceedings Vol. 2437:
Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V
John M. Warlaumont, Editor(s)

© SPIE. Terms of Use
Back to Top