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Proceedings Paper

Application of smoothing techniques to relief-type resist surfaces generated by direct write electron-beam lithography
Author(s): Herbert Engel; Joerg Wengelink; Ralf Steingrueber
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Paper Abstract

Complex relief-type resist surfaces are of increasing interest for applications in optical and photonic devices. They can be fabricated by using direct write electron beam lithography. The crucial point in the fabrication of such reliefs is the inexact approach to the desired resist profile and the increased roughness of the resist surface. This work focusses on three important steps towards a better realization of smooth profiles, i.e. an improvement in beam position accuracy, a reduction of exposure errors caused by the insufficiency of the conversion software and a smoothing technique applied after development. The introduced techniques are expected to considerably improve the functionality of relief type devices.

Paper Details

Date Published: 19 May 1995
PDF: 5 pages
Proc. SPIE 2437, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (19 May 1995); doi: 10.1117/12.209177
Show Author Affiliations
Herbert Engel, Heinrich-Hertz-Institut fuer Nachrichtentechnik Berlin GmbH (Germany)
Joerg Wengelink, Heinrich-Hertz-Institut fuer Nachrichtentechnik Berlin GmbH (Germany)
Ralf Steingrueber, Heinrich-Hertz-Institut fuer Nachrichtentechnik Berlin GmbH (Germany)


Published in SPIE Proceedings Vol. 2437:
Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V
John M. Warlaumont, Editor(s)

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