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Proceedings Paper

Geometry of x-ray point source proximity printing, Part I: linewidth control.
Author(s): Peter A. Hollanda
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Paper Abstract

In this paper the relationship between exposure geometry and intrafield linewidth variations is investigated. The results indicate that (1) minimum linewidth occurs at the center of field where the optical axis intersects the mask/wafer planes, (2) width of vertical and horizontal lines increase linearly with site coordinates x and y, respectively, (3) source-mask field centering errors increase the intrafield linewidth variation, (4) linewidth measurement accuracy is site-dependent because of sloping effect that vary with x and y but remain constant along a column or row, and (5) current intrafield linewidth data characterizing linewidth control in x-ray point-source proximity printing systems.

Paper Details

Date Published: 19 May 1995
PDF: 11 pages
Proc. SPIE 2437, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (19 May 1995); doi: 10.1117/12.209174
Show Author Affiliations
Peter A. Hollanda, Dynamic Automated Systems, Inc. (United States)


Published in SPIE Proceedings Vol. 2437:
Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V
John M. Warlaumont, Editor(s)

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