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Proceedings Paper

Characteristics of the x-ray/EUV emission from spherically pinched and vacuum spark sources
Author(s): Liyan Zhang; Emilio Panarella; B. Hilko; Haibo Chen
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Paper Abstract

In this paper we describe the performances of two kinds of high-flux radiation sources that have been developed at Advanced Laser and Fusion Technology, Inc. The first kind is the spherical pinch which exploits the principle of spherical convergence of strong shock waves in noble gases to generate a hot plasma at the center of a spherical vessel. The temperature of the central plasma can be high enough for emission of broadband radiations from the UV to the soft X-ray region of the spectrum. The second kind is the vacuum spark in which a capacitor is discharged through two properly shaped electrodes in a high vacuum. During the discharge minute spots of hot plasmas are formed on or around the electrodes and strong line radiation (characteristic of the electrode materials) can be generated in the soft X-ray region. High repetition rate operation of the vacuum spark may lead to the dosage required by the submicron lithography technology.

Paper Details

Date Published: 19 May 1995
PDF: 8 pages
Proc. SPIE 2437, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (19 May 1995); doi: 10.1117/12.209173
Show Author Affiliations
Liyan Zhang, Advanced Laser and Fusion Technology, Inc. (Canada)
Emilio Panarella, Advanced Laser and Fusion Technology, Inc. (Canada)
B. Hilko, Advanced Laser and Fusion Technology, Inc. (Canada)
Haibo Chen, Advanced Laser and Fusion Technology, Inc. (Canada)


Published in SPIE Proceedings Vol. 2437:
Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V
John M. Warlaumont, Editor(s)

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