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Proceedings Paper

Optical system design issues in development of projection camera for EUV lithography
Author(s): Tanya E. Jewell
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Paper Abstract

Optical system design issues are described in development of a four- mirror 4x reduction ring-field system for EUV projection lithography at 13 nm wavelength.

Paper Details

Date Published: 19 May 1995
PDF: 7 pages
Proc. SPIE 2437, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (19 May 1995); doi: 10.1117/12.209170
Show Author Affiliations
Tanya E. Jewell, Optical Engineering Consultant (United States)


Published in SPIE Proceedings Vol. 2437:
Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V
John M. Warlaumont, Editor(s)

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