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Proceedings Paper

High-energy (100-keV) e-beam lithography applied for fabrication of deep-submicrometer SAW devices on lithium niobate and quartz
Author(s): Christine A. Kondek; Louis C. Poli
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Paper Abstract

Fabricating submicron feature size Surface Acoustic Wave (SAW) devices on Lithium Niobate and Quartz allows one to take advantage of their unique piezoelectric material properties and operate at higher frequencies. With the recent availability of high performance, high energy e-beam nanowriter tools such as the Leica/Phillips EBPG-HR5 resident at this facility, SAW devices with very narrow line/space transducer gratings can be investigated. Utilizing very high energy (100 keV) direct write electron beam lithography (EBL), allows for processing of deep submicron features with an associated wider process latitude. This is specially desirable when applying EBL to high average Z materials such as lithium niobate. A previously presented paper demonstrated 400 and 500 nm line/space interdigitated transducer fingers on quartz and lithium niobate substrates. E-Beam lithography (30 keV) was used with two and three level, positive and negative tone processes respectively. In this current work a bilevel positive tone process is used by the authors, and involves first spinning a preparation of (1:1) ZEP-320-37 (Nagase Chemical) positive e-beam resist. A commercially available conductive polymer known as TQV-501 (Nitto Chemical) is then spun onto the wafer and serves as a charge removal vehicle. The TQV-501 film is removed by the development procedure. Xylene is used as the developer. Contact pads and interdigitated transducer elements are realized by e-beam metal deposition and lift off process. We will show a direct write positive tone process for the fabrication of deep submicron (400 nM and smaller) interdigitated transducer gratings on Lithium Niobate and Quartz substrates. An improved process dose latitude is seen because of the reduced expected proximity effect at high beam energy.

Paper Details

Date Published: 19 May 1995
PDF: 13 pages
Proc. SPIE 2437, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (19 May 1995); doi: 10.1117/12.209162
Show Author Affiliations
Christine A. Kondek, Army Research Lab. (United States)
Louis C. Poli, Army Research Lab. (United States)


Published in SPIE Proceedings Vol. 2437:
Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V
John M. Warlaumont, Editor(s)

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