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Proceedings Paper

Exposure and characterization of superstructure gratings for DBR lasers generated by direct write electron-beam lithography
Author(s): Ralf Steingrueber; Herbert Engel; R. Loeffler; C. Sakkas
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Paper Abstract

Semiconductor lasers with a wide tuning range can be fabricated with the use of super structure gratings (SSG). In this paper we give a short introduction to SSGs, the technical problem of their realization and the existing techniques to generate SSGs. A method is presented to generate 'true' continuously chirped gratings overcoming the technical restrictions. Furthermore we make a proposal how to characterize SSGs in resist profiles.

Paper Details

Date Published: 19 May 1995
PDF: 5 pages
Proc. SPIE 2437, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (19 May 1995); doi: 10.1117/12.209160
Show Author Affiliations
Ralf Steingrueber, Heinrich-Hertz-Institut fuer Nachrichtentechnik Berlin GmbH (Germany)
Herbert Engel, Heinrich-Hertz-Institut fuer Nachrichtentechnik Berlin GmbH (Germany)
R. Loeffler, Heinrich-Hertz-Institut fuer Nachrichtentechnik Berlin GmbH (Germany)
C. Sakkas, Heinrich-Hertz-Institut fuer Nachrichtentechnik Berlin GmbH (Germany)


Published in SPIE Proceedings Vol. 2437:
Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V
John M. Warlaumont, Editor(s)

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