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Proceedings Paper

Relative surface stoichiometry of high Tc materials by total reflection x-ray fluorescence
Author(s): Richard A. Hockett
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Paper Abstract

A new x-ray technique, called lotal reflection -ay fluorescence (TXRF) analysis, may be able to compare the surface versus bulk stoichiometry for heavy elements (excluding oxygen) in HiTC films. The opportunity in TXRF is that the glancing incident angle of the x-ray source can be varied from below, to above, the critical angle for total external reflectance and thereby can change the analyte depth from a few monolayers to several hundreds of monolayers. The work presented here is a preliminary study of this approach as applied to three films: ErBaCuO/YSZ, YBaCuO/YSZ, and YBaCuO/MgO. The results show little change in relative stoichiometry, but the results are inconclusive because the sample dimensions were too small to allow an accurate determination of the glancing angle for this instrument configuration and the glancing angle may have always been above the angle for total external reflection. Larger area samples are needed to evaluate the concept.

Paper Details

Date Published: 1 October 1990
PDF: 12 pages
Proc. SPIE 1287, High Tc Superconductivity: Thin Films and Applications, (1 October 1990); doi: 10.1117/12.20882
Show Author Affiliations
Richard A. Hockett, Charles Evans & Associates (United States)


Published in SPIE Proceedings Vol. 1287:
High Tc Superconductivity: Thin Films and Applications
Cheng-Chung John Chi; R. Bruce van Dover, Editor(s)

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