Share Email Print
cover

Proceedings Paper

Performance optimization of MOPA pre-pulse LPP light source
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

This paper describes the development and evolution of the critical architecture for a laser-produced-plasma (LPP) extreme-ultraviolet (EUV) source for advanced lithography applications in high volume manufacturing (HVM). In this paper we discuss the most recent results from high power sources in the field and testing on our laboratory based development systems, and describe the requirements and technical challenges related to successful implementation of those technologies on production sources. System performance is shown, focusing on pre-pulse operation with high conversion efficiency (CE) and with dose control to ensure high die yield. Finally, experimental results evaluating technologies for generating stable EUV power output for a high volume manufacturing (HVM) LPP source will be reviewed.

Paper Details

Date Published: 16 March 2015
PDF: 11 pages
Proc. SPIE 9422, Extreme Ultraviolet (EUV) Lithography VI, 94220B (16 March 2015); doi: 10.1117/12.2087421
Show Author Affiliations
Alexander A. Schafgans, Cymer LLC (United States)
Daniel J. Brown, Cymer LLC (United States)
Igor V. Fomenkov, Cymer LLC (United States)
Rick Sandstrom, Cymer LLC (United States)
Alex Ershov, Cymer LLC (United States)
Georgiy Vaschenko, Cymer LLC (United States)
Rob Rafac, Cymer LLC (United States)
Michael Purvis, Cymer LLC (United States)
Slava Rokitski, Cymer LLC (United States)
Yezheng Tao, Cymer LLC (United States)
Daniel J. Riggs, Cymer LLC (United States)
Wayne J. Dunstan, Cymer LLC (United States)
Matthew Graham, Cymer LLC (United States)
Nigel R. Farrar, Cymer LLC (United States)
David C. Brandt, Cymer LLC (United States)
Norbert Böwering, ASML Netherlands B.V. (Netherlands)
Alberto Pirati, ASML Netherlands B.V. (Netherlands)
Noreen Harned, ASML Netherlands B.V. (Netherlands)
Christian Wagner, ASML Netherlands B.V. (Netherlands)
Hans Meiling, ASML Netherlands B.V. (Netherlands)
Ron Kool, ASML Netherlands B.V. (Netherlands)


Published in SPIE Proceedings Vol. 9422:
Extreme Ultraviolet (EUV) Lithography VI
Obert R. Wood; Eric M. Panning, Editor(s)

© SPIE. Terms of Use
Back to Top