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Proceedings Paper

Hybrid metrology implementation: server approach
Author(s): Carmen Osorio; Padraig Timoney; Alok Vaid; Alex Elia; Charles Kang; Cornel Bozdog; Naren Yellai; Eyal Grubner; Toru Ikegami; Masahiko Ikeno
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Paper Abstract

Hybrid metrology (HM) is the practice of combining measurements from multiple toolset types in order to enable or improve metrology for advanced structures. HM is implemented in two phases: Phase-1 includes readiness of the infrastructure to transfer processed data from the first toolset to the second. Phase-2 infrastructure allows simultaneous transfer and optimization of raw data between toolsets such as spectra, images, traces – co-optimization. We discuss the extension of Phase-1 to include direct high-bandwidth communication between toolsets using a hybrid server, enabling seamless fab deployment and further laying the groundwork for Phase-2 high volume manufacturing (HVM) implementation. An example of the communication protocol shows the information that can be used by the hybrid server, differentiating its capabilities from that of a host-based approach. We demonstrate qualification and production implementation of the hybrid server approach using CD-SEM and OCD toolsets for complex 20nm and 14nm applications. Finally we discuss the roadmap for Phase-2 HM implementation through use of the hybrid server.

Paper Details

Date Published: 19 March 2015
PDF: 13 pages
Proc. SPIE 9424, Metrology, Inspection, and Process Control for Microlithography XXIX, 94241H (19 March 2015); doi: 10.1117/12.2087233
Show Author Affiliations
Carmen Osorio, GLOBALFOUNDRIES Inc. (United States)
Padraig Timoney, GLOBALFOUNDRIES Inc. (United States)
Alok Vaid, GLOBALFOUNDRIES Inc. (United States)
Alex Elia, GLOBALFOUNDRIES Inc. (United States)
Charles Kang, Nova Measuring Instruments Inc. (United States)
Cornel Bozdog, Nova Measuring Instruments Inc. (United States)
Naren Yellai, Nova Measuring Instruments Inc. (United States)
Eyal Grubner, Nova Measuring Instruments Ltd. (Israel)
Toru Ikegami, Hitachi High-Technologies Corp. (Japan)
Masahiko Ikeno, Hitachi High-Technologies Corp. (Japan)


Published in SPIE Proceedings Vol. 9424:
Metrology, Inspection, and Process Control for Microlithography XXIX
Jason P. Cain; Martha I. Sanchez, Editor(s)

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