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Proceedings Paper

Improved scatterometry time-to-solution using virtual reference
Author(s): Alok Vaid; Givantha Iddawela; Jamie Tsai; Gilad Wainreb; Paul Isbester; Byung Cheol (Charles) Kang; Michael Klots; Yinon Katz; Cornel Bozdog; Matt Sendelbach
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Paper Abstract

Advanced nodes require precise detection and control of intricate profile details – scatterometry is tool of choice for such requirements. Scatterometry is a model-based technique, and needs extensive reference metrology for qualification. Such reference measurements are costly, time-consuming and often destructive causing delays in deployment. With increasing number of scatterometry steps in flow, and the requirement to collect more reference data points to statistically qualify shrinking metrology specifications, the cost and time for reference metrology is exponentially increasing. This work is aimed to significantly reduce this need. We developed a novel methodology whereby scatterometry spectral information itself is used to predict “virtual” reference data. We qualify this methodology on several key applications from 20nm and 14nm node. We find that performance of solution developed using proposed methodology is indeed similar to performance of solution obtained using real reference data, thereby significantly reducing the lead time to develop scatterometry solutions.

Paper Details

Date Published: 19 March 2015
PDF: 9 pages
Proc. SPIE 9424, Metrology, Inspection, and Process Control for Microlithography XXIX, 94240X (19 March 2015); doi: 10.1117/12.2087232
Show Author Affiliations
Alok Vaid, GLOBALFOUNDRIES Inc. (United States)
Givantha Iddawela, GLOBALFOUNDRIES Inc (United States)
Jamie Tsai, GLOBALFOUNDRIES Inc. (United States)
Gilad Wainreb, Nova Measuring Instruments Ltd. (Israel)
Paul Isbester, Nova Measuring Instruments Inc. (United States)
Byung Cheol (Charles) Kang, Nova Measuring Instruments Inc. (United States)
Michael Klots, Nova Measuring Instruments Ltd. (Israel)
Yinon Katz, Nova Measuring Instruments Ltd. (Israel)
Cornel Bozdog, Nova Measuring Instruments Inc. (United States)
Matt Sendelbach, Nova Measuring Instruments Inc. (United States)


Published in SPIE Proceedings Vol. 9424:
Metrology, Inspection, and Process Control for Microlithography XXIX
Jason P. Cain; Martha I. Sanchez, Editor(s)

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