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Proceedings Paper

Immersion and dry scanner extensions for sub-10nm production nodes
Author(s): Stefan Weichselbaum; Frank Bornebroek; Toine de Kort; Richard Droste; Roelof F de Graaf; Rob van Ballegoij; Herman Botter; Matthew G McLaren; Wim P de Boeij
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Paper Abstract

Progressing towards the 10nm and 7nm imaging node, pattern-placement and layer-to-layer overlay requirements keep on scaling down and drives system improvements in immersion (ArFi) and dry (ArF/KrF) scanners. A series of module enhancements in the NXT platform have been introduced; among others, the scanner is equipped with exposure stages with better dynamics and thermal control. Grid accuracy improvements with respect to calibration, setup, stability, and layout dependency tighten MMO performance and enable mix and match scanner operation. The same platform improvements also benefit focus control. Improvements in detectability and reproducibility of low contrast alignment marks enhance the alignment solution window for 10nm logic processes and beyond. The system’s architecture allows dynamic use of high-order scanner optimization based on advanced actuators of projection lens and scanning stages. This enables a holistic optimization approach for the scanner, the mask, and the patterning process. Productivity scanner design modifications esp. stage speeds and optimization in metrology schemes provide lower layer costs for customers using immersion lithography as well as conventional dry technology. Imaging, overlay, focus, and productivity data is presented, that demonstrates 10nm and 7nm node litho-capability for both (immersion & dry) platforms.

Paper Details

Date Published: 18 March 2015
PDF: 11 pages
Proc. SPIE 9426, Optical Microlithography XXVIII, 942616 (18 March 2015); doi: 10.1117/12.2087112
Show Author Affiliations
Stefan Weichselbaum, ASML Netherlands B.V. (Netherlands)
Frank Bornebroek, ASML Netherlands B.V. (Netherlands)
Toine de Kort, ASML Netherlands B.V. (Netherlands)
Richard Droste, ASML Netherlands B.V. (Netherlands)
Roelof F de Graaf, ASML Netherlands B.V. (Netherlands)
Rob van Ballegoij, ASML Netherlands B.V. (Netherlands)
Herman Botter, ASML Netherlands B.V. (Netherlands)
Matthew G McLaren, ASML Netherlands B.V. (Netherlands)
Wim P de Boeij, ASML Netherlands B.V. (Netherlands)


Published in SPIE Proceedings Vol. 9426:
Optical Microlithography XXVIII
Kafai Lai; Andreas Erdmann, Editor(s)

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