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Proceedings Paper

Customization and design of directed self-assembly using hybrid prepatterns
Author(s): Joy Cheng; Gregory S. Doerk; Charles T. Rettner; Gurpreet Singh; Melia Tjio; Hoa Truong; Noel Arellano; Srinivasan Balakrishnan; Markus Brink; Hsinyu Tsai; Chi-Chun Liu; Michael A. Guillorn; Daniel P. Sanders
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Paper Abstract

Diminishing error tolerance renders the customization of patterns created through directed self-assembly (DSA) extremely challenging at tighter pitch. A self-aligned customization scheme can be achieved using a hybrid prepattern comprising both organic and inorganic regions that serves as a guiding prepattern to direct the self-assembly of the block copolymers as well as a cut mask pattern for the DSA arrays aligned to it. In this paper, chemoepitaxy-based self-aligned customization is demonstrated using two types of organic-inorganic prepatterns. CHEETAH prepattern for “CHemoepitaxy Etch Trim using a self-Aligned Hardmask” of preferential hydrogen silsesquioxane (HSQ, inorganic resist), non-preferential organic underlayer is fabricated using electron beam lithography. Customized trench or hole arrays can be achieved through co-transfer of DSA-formed arrays and CHEETAH prepattern. Herein, we also introduce a tone-reversed version called reverse-CHEETAH (or rCHEETAH) in which customized line segments can be achieved through co-transfer of DSA-formed arrays formed on a prepattern wherein the inorganic HSQ regions are nonpreferential and the organic regions are PMMA preferential. Examples of two-dimensional self-aligned customization including 25nm pitch fin structures and an 8-bar “IBM” illustrate the versatility of this customization scheme using rCHEETAH.

Paper Details

Date Published: 19 March 2015
PDF: 8 pages
Proc. SPIE 9423, Alternative Lithographic Technologies VII, 942307 (19 March 2015); doi: 10.1117/12.2086973
Show Author Affiliations
Joy Cheng, IBM Research - Almaden (United States)
Gregory S. Doerk, IBM Research - Almaden (United States)
Charles T. Rettner, IBM Research - Almaden (United States)
Gurpreet Singh, IBM Research - Almaden (United States)
Melia Tjio, IBM Research - Almaden (United States)
Hoa Truong, IBM Research - Almaden (United States)
Noel Arellano, IBM Research - Almaden (United States)
Srinivasan Balakrishnan, IBM Research - Almaden (United States)
Markus Brink, IBM Research - Almaden (United States)
Hsinyu Tsai, IBM Thomas J. Watson Research Ctr. (United States)
Chi-Chun Liu, IBM Corp. (United States)
Michael A. Guillorn, IBM Thomas J. Watson Research Ctr. (United States)
Daniel P. Sanders, IBM Research - Almaden (United States)


Published in SPIE Proceedings Vol. 9423:
Alternative Lithographic Technologies VII
Douglas J. Resnick; Christopher Bencher, Editor(s)

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