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Proceedings Paper

Computational approaches to DSA-assisted lithography applications
Author(s): Tim Fühner; Ulrich Welling; Przemyslaw Michalak; Juan Carlos Orozco Rey; Weihua Li; Marcus Müller; Andreas Erdmann
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Date Published:
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Proc. SPIE 9426, Optical Microlithography XXVIII, 942615; doi: 10.1117/12.2086952
Show Author Affiliations
Tim Fühner, Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB (Germany)
Ulrich Welling, Georg-August-Univ. Göttingen (Germany)
Przemyslaw Michalak, Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB (Germany)
Juan Carlos Orozco Rey, Georg-August-Univ. Göttingen (Germany)
Weihua Li, Georg-August-Univ. Göttingen (Germany)
Marcus Müller, Georg-August-Univ. Göttingen (Germany)
Andreas Erdmann, Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB (Germany)


Published in SPIE Proceedings Vol. 9426:
Optical Microlithography XXVIII
Kafai Lai; Andreas Erdmann, Editor(s)

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